Included in the display will be Carl Zeiss’ unique software for correlative microscopy in materials analysis, which is invaluable for transforming electron beam lithography workflow by bridging the electron and florescent light microscopy systems together. Enabling users to recall regions of interest in fixed specimens in an electron microscope that were previously identified in a light microscope and vice versa, the ‘Shuttle & Find’ interface allows for precise and rapid overlay of light and electron microscope images, high-resolution magnification of details, and the merger of functional and structural information. Users can also analyze thousands to millions of cubic micrometers of volume in all three dimensions at nanometer scale resolution.
Carl Zeiss’ correlative microscopy solution, with their innovative ‘Shuttle & Find’ program, is an integrated hardware and software solution that will enable new insights into the micro and nano worlds. Facilitating a quicker Electron beam lithography workflow, the new system reduces cycle times as well as provides high quality image processing, analysis, and documentation. For more information, visit http://microscopy.zeiss.com/microscopy/en_us/local/PITTCON2013.html.
About Carl Zeiss
Carl Zeiss Microscopy, LLC, offers microscopy solutions and systems for research, routine, and industrial applications. In addition, Carl Zeiss Microscopy markets microscopy systems for the clinical market, as well as optical sensor systems for industrial and pharmaceutical applications. Since 1846, Carl Zeiss has remained committed to enabling science and technology to go beyond what man can see. Today, Carl Zeiss is a global leader in the optical and opto-electronic industries.
With 12,872 current employees and offices in over 30 countries, Carl Zeiss is represented in more than 100 countries with production centers in Europe, North America, Central America and Asia. For more information on the breadth of solutions offered by Carl Zeiss Microscopy, please visit www.zeiss.com/micro.
