GRENOBLE, France--(BUSINESS WIRE)--CEA-Leti announced today that the 2nd Maskless Lithography IMAGINE Workshop will be held Sept. 6 at the Keio Plaza Hotel in Tokyo. CEA-Leti and MAPPER Lithography B.V. launched the IMAGINE program in July 2009 with the delivery of MAPPER’s Massively Parallel Electron Beam Platform to Leti. The platform is the core technology on which the IMAGINE program is built. This program provides the world’s major chip manufacturers with the opportunity to assess the maskless lithography technology in a real manufacturing environment. In addition, the program will develop and qualify the complete infrastructure from data preparation to process integration, in preparation for its industrial introduction.
