PORT WASHINGTON, N.Y.--(BUSINESS WIRE)--Interactions between nanoparticles and filter media is the topic of a recent research study conducted by Lewis University (Romeoville, IL) in collaboration with Pall Corporation (NYSE:PLL). The findings of the study will be presented by Pall at the International Conference on Planarization/CMP Technology (ICPT), Nov. 9-11 in Seoul, Korea. The conference is an international forum for academic researchers, industrial practitioners and engineers from around the world for the exchange of information on research in chemical mechanical planarization (CMP) technology.
