HILLSBORO, Ore., April 26, 2010 (GLOBE NEWSWIRE) -- FEI Company (Nasdaq:FEIC), a leading diversified scientific instruments company providing electron and ion-beam microscopes and tools for nanoscale applications across many industries, today introduced the new Helios NanoLab™ x50 DualBeam™ Series, the most powerful and versatile DualBeam system available on the market today. It integrates FEI’s extreme high-resolution scanning electron microscope (XHR SEM) with a new, high-performance focused ion beam (FIB), to deliver an unprecedented level of imaging and milling capability for leading-edge applications in semiconductor and materials science research and development.
