PhotoMedex, Inc. Release: NEOVA® Launches DNA Barrier Accelerator, a New Hyper-Active Moisturizer
Published: Oct 03, 2013
MONTGOMERYVILLE, Pa., Oct. 3, 2013 /PRNewswire/ -- PhotoMedex (NasdaqGS and TASE: PHMD), the leader in photodamage repair technology, clinical skincare and medical laser products for more than a decade, introduces NEOVA® SmartSkinCare brand's DNA Barrier Accelerator, a hyper-active moisturizer that rehabilitates and fortifies the skin's essential protective barrier. DNA Barrier Accelerator is available for purchase in dermatology offices nationwide and on NEOVA.com.
DNA Barrier Accelerator combats signs of damages to the skin's barrier and repairs them, using award-winning DNA Repair + Copper Peptide Complex® (CpC) technologies and botanical extracts. The highly effective and fast-acting formula preserves moisture, elevates repair-and-protection levels and calms the skin. In a clinical study occurring over three days, a decrease of 12.6 percent in Trans Epidermal Water Loss (TEWL), the standard diagnostic method for measuring moisture in the skin barrier, was found after DNA Barrier Accelerator was applied twice daily compared to those untreated with a two percent decrease in TEWL.*
"The stratum corneum (SC) acts as a protective barrier for the skin; when the SC is healthy, it protects the skin from UV exposure and environmental aggressors. When the skin is exposed to harmful UV rays, the SC becomes compromised, reducing the skin's natural defenses and increasing the risk of skin disorders," said Dr. Helen Torok, Board-Certified Dermatologist. "NEOVA® DNA Barrier Accelerator strengthens the skin's barrier to prevent UV-related skin damage."
Four key ingredients in DNA Barrier Accelerator - DNA CoFactor, Merospheres, Lactomide and Linoleic Acid - work together to strengthen the barrier stratum corneum health and functionality, while reversing signs of aging caused by UV exposure:
- DNA CoFactor, a combination of DNA Repair Enzymes and CpC,boosts the skin's repair-and-protection levels to defend against the signs of UV damage
- Merospheres, (rosemary extract), reduces damage caused by stress, free radicals and other toxins to the skin ultimately protecting the individual skin cells and preventing age-related skin damage
- Lactomide, an essential ceramide and lipids from milk, enhances the skin's outer barrier
- Linoleic Acid, an essential fatty acid, helps to restore smoothness and combat hyperpigmentation
"Millions of Americans neglect to realize the damaging effects that UV exposure has on the skin," said Dr. Dolev Rafaeli, PhotoMedex CEO. "By adding DNA Barrier Accelerator to the NEOVA® Brand, we're providing a solution that delivers results unlike any other product on the market."
NEOVA® DNA Barrier Accelerator is available online at www.neova.com for MSRP $105.00, 1.7 oz.
*An investigation into The Effect of a Topical Treatment on Skin Barrier Protection, Data on File, PhotoMedex
PhotoMedex is a global skin health company providing integrated disease management and aesthetic solutions to dermatologists, professional aestheticians and consumers. The company provides proprietary products and services that address skin diseases and conditions including psoriasis, vitiligo, acne, actinic keratosis (a precursor to certain types of skin cancer) and photodamage. Its experience in the physician market provides the platform to expand its skin health solutions to spa markets, as well as traditional retail, online and infomercial outlets for home-use products. As a result of its December 2011 merger with Radiancy Inc., PhotoMedex has added a range of home-use devices under the no!no! brand, for various indications including hair removal, acne treatment and skin rejuvenation. The company also offers a professional product line for acne clearance, skin tightening, psoriasis care and hair removal sold to physician clinics and spas.
SAFE HARBOR STATEMENT
Investors are cautioned that statements in this press release constitute forward-looking statements that involve risks and uncertainties. Actual results may differ materially from the results anticipated in these forward-looking statements. Additional information on potential factors that could affect our results and other risks and uncertainties are detailed in PhotoMedex's periodic reports, including its Annual Report on Form 10-K for the year ended December 31, 2012, available on the SEC's web site at www.sec.gov.
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