EAST HILLS, N.Y.--(BUSINESS WIRE)--July 10, 2006--The fast growing semiconductor market’s move to narrower linewidths continues to drive the need for new and innovative filtration technologies that can achieve cleaner and purer fluids. Pall Corporation (NYSE: PLL - News), a global leader in microelectronics technologies, is introducing nine new products that boost process reliability, reproducibility and productivity and help the industry meet its changing needs. The new products for chemical, gas, photolithography and chemical mechanical polishing (CMP) applications are the latest additions to the Company’s extensive portfolio for improving the economics of integrated circuit and display manufacturing. They will be showcased at Semicon West starting today.
