Synopsys Joins CEA-Leti's IMAGINE Program on Maskless Lithography

Published: Sep 19, 2011

GRENOBLE, France--(BUSINESS WIRE)--CEA-Leti today announced that Synopsys, Inc., a world leader in software and IP used in the design, verification and manufacture of electronic components and systems, has joined the IMAGINE program designed to develop maskless lithography for IC manufacturing. Synopsys is the 10th industrial partner to join IMAGINE.

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