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Thornwood, N.Y.: Carl Zeiss Microscopy, LLC, announces that it is holding three workshop series on its innovative scanning electron microscope (SEM) products. Separate events will be held for the ZEISS Field Emission Scanning Electron Microscope (SIGMA, SUPRA®, ULTRA & MERLIN® Series); the Crossbeam® (FIB-SEM); and the EVO® Series SEM. Each of these hands on workshops can be tailored to the particular SEM experience level of participants, and ample time is given for questions and hands-on practice using the participants’ samples.
The FE-SEM Series Workshop covering the SIGMA, SUPRA®, ULTRA & MERLIN® Series is a two day workshop that will be held May 21-22, 2013 in California and September 18-19, 2013 in New York. The workshop includes a review of basic instrument principles, operations and parameter adjustments, a discussion of the effects of changing parameters on image quality, and an overview of the extensive software features available.
The three day Crossbeam® (FIB-SEM) Workshop will be held May 14-16, 2013 in Massachusetts. The event is designed to develop advanced general FIB-SEM skills and to reinforce and enhance software-based skills on the ZEISS SmartSEM® graphical user interface. Participants will review fundamental principles of electron optics, ion beam optics, system configurations, and applications, as well as FIB alignment and calibration. A hands-on session on sample mounting and loading, basic and advanced patterning, high resolution live imaging, creating AVI files, and 3D analytics will also be included. TEM sample preparation will be discussed, also.
The two day EVO® Series SEM Workshop will be held March 12-13, 2013 in California, July 10-11, 2013 in Massachusetts, and September 18-19, 2013 in New York. Fundamental principles of SEM parameters will be reviewed and discussed in the context of their effects on image quality. A review of the EVO SEM’s operation, making parameter adjustments with the mouse, joystick, control panel, keyboard and tool bar icons functions, operations during the complete range of fundamental operating modes, and instrument cleaning and maintenance will also be covered. Other topics vary depending upon the participants, and may include an extended pressure workshop, correlative microscopy, remote SEM operations, SEM automation, or STEM imaging.
About Carl Zeiss
Carl Zeiss Microscopy, LLC, offers microscopy solutions and systems for research, routine, and industrial applications. In addition, Carl Zeiss Microscopy markets microscopy systems for the clinical market, as well as optical sensor systems for industrial and pharmaceutical applications. Since 1846, Carl Zeiss has remained committed to enabling science and technology to go beyond what man can see. Today, Carl Zeiss is a global leader in the optical and opto-electronic industries.
With 12,872 current employees and offices in over 30 countries, Carl Zeiss is represented in more than 100 countries with production centers in Europe, North America, Central America and Asia. For more information on the breadth of solutions offered by Carl Zeiss Microscopy, please visit www.zeiss.com/micro.
Attention publishers: Please forward all Sales Inquiries to: Maya Everett, Carl Zeiss Microscopy, (914) 681-7782, email@example.com
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