Carl Zeiss Announces Significant Smaller Footprint of New Generation Photomask Metrology System PROVEĀ® Compact  
8/28/2012 2:12:26 PM

JENA, Germany--(BUSINESS WIRE)--The new generation photomask registration and overlay metrology system PROVEĀ® Compact, developed by Carl Zeiss, now has a reduced footprint of 30 % compared to its predecessor. Through a new design concept the system now consists of one main unit and two satellites, which can be clearly separated. With the new dimensions Mask Shops gain a higher flexibility and, even more important, save costs of ownership.