SHANGHAI, China, March 20, 2012 – Applied Materials, Inc. today announced new PECVD film
technology to produce higher-performance, high-resolution displays for next-generation tablet computers
and TVs. Available on Applied’s industry-leading AKT-PECVD system, these advanced insulating films
enable the use of metal oxide-based transistors that produce smaller, faster-switching pixels to create
higher resolution screens preferred by consumers.
Applied’s new PECVD films provide a dielectric-layer interface for metal oxide transistors that
minimizes hydrogen impurities to improve transistor stability and deliver optimized screen performance.
These high-quality silicon oxide (SiO2) films can be deposited by the AKT-PECVD system with precise
uniformity on sheets of glass up to 9m2
in size – a capability that is critical to achieving high production
yields and low manufacturing costs.
“Display makers are aggressively investing in metal oxide transistor capability, and our advanced PECVD
films overcome the uniformity and stability challenges of these complex dielectric films, clearing a major
hurdle to implementing this important new technology,” said Tom Edman, group vice president and
general manager of Applied’s AKT Display Business Group. “By extending the capabilities of our world-
class AKT-PECVD system to dielectric film deposition for metal oxide, Applied has provided a rapid,
cost-effective path to help bring this technology to market. Customers have had excellent results with
these new films on our system and we are seeing strong demand from major display manufacturers for
upgrades and new systems.”
In addition to its new PECVD films, Applied is currently developing advanced PVD solutions, including
IGZO deposition, for metal oxide manufacturing. Using its latest rotary cathode array technology,
Applied is demonstrating highly-uniform, homogeneous and low-defect, active-layer deposition at higher
productivity rates and lower material consumption costs than currently available PVD solutions.
Applied Materials will showcase its solutions for metal oxide, thin film transistor liquid crystal display
manufacturing at FPD China 2012 from March 20-22 in Shanghai. To learn more about Applied’s
activities at the show, visit www.appliedmaterials.com/newsroom/events/semicon-china-2012.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in providing innovative equipment, services
and software to enable the manufacture of advanced semiconductor, flat panel display and solar
photovoltaic products. Our technologies help make innovations like smartphones, flat screen TVs and
solar panels more affordable and accessible to consumers and businesses around the world. At Applied
Applied Materials Introduces Advanced CVD Films to Enable Metal Oxide-Based High Resolution Displays_20Mar12 Externa Materials, we turn today’s innovations into the industries of tomorrow. Learn more at
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