Bruker Corporation Introduces New AFM Semiconductor Characterization Solution
4/4/2013 11:58:10 AM
SANTA BARBARA, Calif.--(BUSINESS WIRE)--Bruker announced today the release of the Dimension Icon® SSRM-HR, a new atomic force microscope (AFM) configuration including the Scanning Spreading Resistance Microscopy (SSRM) module, designed specifically for high-resolution (HR) semiconductor characterization. Integrating Bruker’s industry-leading Dimension Icon AFM platform with an environmental control system capable of 1ppm gas purity and high-vacuum control, the Dimension Icon SSRM-HR system provides vastly improved repeatability and spatial resolution in semiconductor carrier profiling. As confirmed by Imec (www.imec.be), buried gate oxide layers as thin as 5Å are detected routinely.
comments powered by